EUNO.NEWS EUNO.NEWS
  • All (7970) +28
  • AI (1325) +4
  • DevOps (398) +2
  • Software (3928) +15
  • IT (2299) +7
  • Education (20)
  • Notice
  • All (7970) +28
    • AI (1325) +4
    • DevOps (398) +2
    • Software (3928) +15
    • IT (2299) +7
    • Education (20)
  • Notice
  • All (7970) +28
  • AI (1325) +4
  • DevOps (398) +2
  • Software (3928) +15
  • IT (2299) +7
  • Education (20)
  • Notice
Sources Tags Search
한국어 English 中文
  • 15 hours ago · it

    China may have reverse engineered EUV lithography tool in covert lab, report claims — employees given fake IDs to avoid secret project being detected, prototypes expected in 2028

    China has reportedly built and begun testing a secret EUV lithography prototype using ASML-style laser-produced plasma technology. Yet, despite generating 13.5-...

    #EUV lithography #China #ASML #semiconductor manufacturing #reverse engineering #chip production #hardware #technology espionage
  • 1 day ago · it

    Intel installs industry's first commercial High-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A

    Intel has installed and qualified ASML's TWINSCAN EXE:5200B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plan...

    #Intel #ASML #High-NA EUV #TWINSCAN EXE:5200B #14A process #semiconductor manufacturing #lithography
EUNO.NEWS
RSS GitHub © 2025