Intel installs industry's first commercial High-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A

Published: 1 day ago (December 17, 2025 at 07:25 AM EST)

1 min read

Source: Tom’s Hardware

Intel qualifies ASML’s TWINSCAN EXE:5200B

Intel has installed and qualified ASML’s TWINSCAN EXE:5200B, the first High‑NA EUV lithography tool designed for commercial production, reiterating Intel’s plans to use High‑NA EUV patterning for 14A process technology and onwards.

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Intel qualifies ASML’s TWINSCAN EXE:5200B

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