China may have reverse engineered EUV lithography tool in covert lab, report claims — employees given fake IDs to avoid secret project being detected, prototypes expected in 2028

Source: Tom’s Hardware

Overview

China has reportedly built and begun testing a secret EUV lithography prototype using ASML‑style laser‑produced plasma technology. Despite generating 13.5‑nm light, the system remains unable to make chips and appears to be years away from achieving a complete, production‑ready EUV manufacturing capability.