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  • 1 day ago · it

    Intel installs industry's first commercial High-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A

    Intel has installed and qualified ASML's TWINSCAN EXE:5200B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plan...

    #Intel #ASML #High-NA EUV #TWINSCAN EXE:5200B #14A process #semiconductor manufacturing #lithography
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