1 day ago · it

New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing

Japan’s Dai Nippon Printing DNP claims to have developed a nanoimprint lithography template capable of patterning logic with a feature size of 1.4nm, with plans...

5 days ago · it

China mulls $70 billion domestic chip fabrication injection, would be largest of any government semiconductor investment — Huawei and Cambricon among candidates in push to compete with Nvidia, other U.S. firms

China is considering investing up to an additional $70 billion in its domestic chip manufacturers in an effort to better compete with US firms like Nvidia. Alth...